M600 Metal/Oxide MBE System
The M600 metal MBE is a UHV evaporation system especially designed for high quality deposition or epitaxial growth of metals, oxides and metal superlattices.
The growth chamber has two ports for single or multi-crucible electron guns and up to eight ports for effusion cells or other sources. The system can be configured for 1.5", 2", 3" or 4" max. substrate size.
The growth chamber has several ports reserved for precise flux control equipment. In the standard configuration the electron gun fluxes are controlled using quartz crystal film thickness monitors. Ports are reserved for more accurate flux control using either cross beam quadrupole mass spectrometer or atomic absorption spectroscopy.
The top photo shows the M600 metal MBE system at the Trinity College in Dublin, Ireland. Prof. Igor Shvets group uses the DCA system for the growth of magnetic oxide epitaxial films and heterojunctions. (photo courtesy of Trinity College).
The second photo shows the M600 MBE at the Max-Planck Institute für Metall Forschung, in Stuttgart, Germany.
Several different substrate and sample manipulators are available for this system.
Many of the DCA metal MBE systems are highly custom designed. The complex system shown below was installed at the Pacific Northwest Laboratories Environmental Molecular Sciences Laboratory (EMSL). Dr. Scott Chambers uses the MBE system to grow high-quality epitaxial oxide thin films and nanostructures.
Currently, the EMSL researchers are using this system for the growth of copper oxide quantum dots, multilayer electrolyte materials and thin film metal oxides for fundamental surface chemistry studies. Photo courtesy of Pacific Northwest Laboratories.
